Tsukada Noriaki | Central Research Laboratory, Mitsubishi Electric Corp.
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概要
Central Research Laboratory, Mitsubishi Electric Corp. | 論文
- Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I)
- The Effect of Gas Plasma Irradiation on Transistor
- A New Undercutting Phenomenon in Plasma Etching
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film