Kometani J. | Lucent Technologies
スポンサーリンク
概要
Lucent Technologies | 論文
- High Energy B Implantation for Fe Gettering ; Evaluation of 7.5nm Thick Gate Oxide Reliability
- ファイバ増幅器と波長変換による高効率紫外光源
- Proximity Effect Correction in Projection Electron Beam Lithography (Scattering with Angular Limitation Projection Electron-Beam Lithography)
- Mechanical Modeling of Projection Electron-Beam Lithography Masks
- The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System