The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System
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概要
- 論文の詳細を見る
A SCALPEL^<[○!R]> (SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.
- 社団法人応用物理学会の論文
- 1995-12-30
著者
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Berger S
Bell Lab. Nj
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Harriott L
Bell Lab. Nj
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Peabody M
Bell Lab. Nj
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Watson G.
At&t Bell Laboratories
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Watson G
At&t Bell Lab. New Jersey Usa
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Connelly Wayne
At&t Bell Laboratories
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LIDDLE J.
AT&T Bell Laboratories
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WATSON G.
AT&T Bell Laboratories
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BERGER Steven
AT&T Bell Laboratories
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Liddle J.
Lucent Technologies
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Fetter L
Bell Lab. Nj
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BIDDICK Chris
AT&T Bell Laboratories
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BLAKEY Myrtle
AT&T Bell Laboratories
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BOLAN Keven
AT&T Bell Laboratories
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BOWLER Stephen
AT&T Bell Laboratories
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BRADY Kevin
AT&T Bell Laboratories
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CAMARDA Ron
AT&T Bell Laboratories
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CONNELLY Wayne
AT&T Bell Laboratories
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CRORKEN Andy
AT&T Bell Laboratories
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CUSTY Joe
AT&T Bell Laboratories
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FARROW Reggie
AT&T Bell Laboratories
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FELKER Joe
AT&T Bell Laboratories
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FETTER Linus
AT&T Bell Laboratories
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FREEMAN Bob
AT&T Bell Laboratories
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HARRIOTT Lloyd
AT&T Bell Laboratories
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HOPKINS Leslie
AT&T Bell Laboratories
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HUGGINS Harold
AT&T Bell Laboratories
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KNUREK Chester
AT&T Bell Laboratories
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KRAUS Joe
AT&T Bell Laboratories
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MIXON Dave
AT&T Bell Laboratories
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MKRTCHYAN Masis
AT&T Bell Laboratories
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NOVEMBRE Anthony
AT&T Bell Laboratories
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PEABODY Milton
AT&T Bell Laboratories
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SIMPSON Wayne
AT&T Bell Laboratories
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TARASCON Regine
AT&T Bell Laboratories
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WADE Harry
AT&T Bell Laboratories
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WASKIEWICZ Warren
AT&T Bell Laboratories
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WILLIAMS Joe
AT&T Bell Laboratories
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WINDT David
AT&T Bell Laboratories
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Custy Joe
At&t Bell Laboratories
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Kraus Joe
At&t Bell Laboratories
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Wade Harry
At&t Bell Laboratories
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Mixon Dave
At&t Bell Laboratories
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Felker Joe
At&t Bell Laboratories
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Bolan K
Bell Lab. Nj
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Brady Kevin
At&t Bell Laboratories
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Windt David
At&t Bell Laboratories
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Camarda Ron
At&t Bell Laboratories
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Freeman Bob
At&t Bell Laboratories
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Crorken Andy
At&t Bell Laboratories
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Williams Joe
At&t Bell Laboratories
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Simpson Wayne
At&t Bell Laboratories
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Blakey M
Bell Lab. Nj
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Farrow Reggie
At&t Bell Laboratories
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Biddick C
Bell Lab. Nj
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Bowler Stephen
At&t Bell Laboratories
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Huggins Harold
At&t Bell Laboratories
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Knurek Chester
At&t Bell Laboratories
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Hopkins Leslie
At&t Bell Laboratories
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Tarascon R
Bell Lab. Nj
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Waskiewicz Warren
At&t Bell Laboratories
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Novembre A
Bell Lab. Nj
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Mkrtchyan Masis
At&t Bell Laboratories
関連論文
- From Relaxed GeSi Buffers to Field Effect Transistors : Current Status and Future Prospects
- Proximity Effect Correction in Projection Electron Beam Lithography (Scattering with Angular Limitation Projection Electron-Beam Lithography)
- Mechanical Modeling of Projection Electron-Beam Lithography Masks
- The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System
- Focused-Ion-Beam-Induced Gas Etching