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Lucent Technologies | 論文
- ファイバ増幅器と波長変換による高効率紫外光源
- High Energy B Implantation for Fe Gettering ; Evaluation of 7.5nm Thick Gate Oxide Reliability
- Proximity Effect Correction in Projection Electron Beam Lithography (Scattering with Angular Limitation Projection Electron-Beam Lithography)
- Mechanical Modeling of Projection Electron-Beam Lithography Masks
- The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System
- 解説 Interpretation of TEM Images of Impurities in E1ectrodeposited Films
- The FB Mechanism for TCP over UBR in Subnet ATM Models
- SB-12-5 An Intelligent Service Mediator for the deployment of network APIs.