Hydrogen Sensor Based on RF-Sputtered Thermoelectric SiGe Film
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-04-15
著者
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Izu N
Aist Nagoya Jpn
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SHIN Woosuck
Synergy Materials Research Center, National Institute of Advanced Industrial Science and Technology
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IZU Noriya
Synergy Materials Research Center, National Institute of Advanced Industrial Science and Technology
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MURAYAMA Norimitsu
Synergy Materials Research Center, National Institute of Advanced Industrial Science and Technology
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Shin W
産業技術総合研
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QIU Fabin
Synergy Materials Research Center, National Institute of Advanced Industrial Science and Technology
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MATSUMIYA Masahiko
Synergy Materials Research Center, National Institute of Advanced Industrial Science and Technology
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Murayama N
Aist Nagoya Jpn
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Qiu F
Aist Nagoya Jpn
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Matsumiya M
Aist Nagoya Jpn
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Qu Fabin
Synergy Materials Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
関連論文
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- Hydrogen Sensor Based on RF-Sputtered Thermoelectric SiGe Film
- 07-P-04 RF-Sputtered Polycrystalline Si_Ge_ Thin Film for Thermoelectric Hydrogen Sensor
- Thermoelectric Thick-Film Hydrogen Gas Sensor Operating at Room Temperature : Electrical Properties of Condensed Matter
- Hydrogen Sensor Based on RF-Sputtered Thermoelectric SiGe Film