Control of Nano-Structure of Photocatalytic TiO₂ Films by Oxygen Ion Assisted Glancing Angle Deposition (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
スポンサーリンク
概要
著者
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HOSHI Yoichi
Tokyo Polytechnic University
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Hoshi Yoichi
Tokyo Polytechnic University, Atsugi, Kanagawa 243-0297, Japan
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Yasuda Yoji
Tokyo Polytechnic University, Atsugi, Kanagawa 243-0297, Japan
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Kitahara Naoto
Tokyo Polytechnic University, Atsugi, Kanagawa 243-0297, Japan
関連論文
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- Investigation of Low-Damage Sputter-Deposition of ITO Films on Organic Emission Layer
- High Rate Sputter-Deposition of TiO_2 Films Using Oxide Target(Recent Progress in Oxide Thin Films by Sputtering)
- Special Section on Recent Progress in Oxide Thin Films by Sputtering
- Photocatalytic Characteristics of TiO2 Films Deposited by Oxygen Plasma-Assisted Reactive Evaporation Method
- Control of Nano-Structure of Photocatalytic TiO₂ Films by Oxygen Ion Assisted Glancing Angle Deposition (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
- Control of Nano-Structure of Photocatalytic TiO