Photocatalytic Characteristics of TiO2 Films Deposited by Oxygen Plasma-Assisted Reactive Evaporation Method

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概要

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• Titanium dioxide (TiO2) films were deposited by the oxygen plasma-assisted reactive evaporation (OPARE) method. TiO2 films with an anatase structure were formed when activated oxygen plasma was supplied to the substrate during deposition, whereas the films with a rutile structure were formed when nonactivated oxygen gas was supplied. These results were explained by the promotion of the oxidization of titanium atoms by the supply of activated oxygen plasma, because the anatase film is obtained under conditions where sufficient oxidization of titanium atoms is achieved, and the rutile film is formed under the conditions where insufficient oxidization occurs. These results indicate that oxygen plasma assist is an effective method for promoting oxidization and reducing the amount of oxygen gas used in this method. Both films deposited with or without plasma assist at temperatures greater than 250 °C exhibited ultra-hydrophilicity. These films also showed definition methylene-blue (MB) decomposition photocatalytic performance indexes in the range from 7.8–11.9 μmol$\cdot$l-1$\cdot$min-1. The described results indicate that the TiO2 films obtained by this method exhibit adequate performance for photocatalytic applications.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-08-25

著者

• HOSHI Yoichi

  Tokyo Polytechnic University

• Aoki Wataru

  Tokyo Polytechnic University, Faculty of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Sakai Tetsuya

  Tokyo Polytechnic University, Graduate School of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Hoshi Yoichi

  Tokyo Polytechnic University, Graduate School of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Kuniyoshi Yuji

  Tokyo Polytechnic University, Graduate School of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Ezoe Sho

  Tokyo Polytechnic University, Faculty of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Endo Tatsuya

  Tokyo Polytechnic University, Faculty of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

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• Investigation of Low-Damage Sputter-Deposition of ITO Films on Organic Emission Layer
• High Rate Sputter-Deposition of TiO_2 Films Using Oxide Target(Recent Progress in Oxide Thin Films by Sputtering)
• Special Section on Recent Progress in Oxide Thin Films by Sputtering
• Photocatalytic Characteristics of TiO2 Films Deposited by Oxygen Plasma-Assisted Reactive Evaporation Method
• Control of Nano-Structure of Photocatalytic TiO₂ Films by Oxygen Ion Assisted Glancing Angle Deposition (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
• Control of Nano-Structure of Photocatalytic TiO

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