HOSHI Yoichi | Tokyo Polytechnic University

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概要

• HOSHI Yoichiの詳細を見る
• 同名の論文著者
• Tokyo Polytechnic Universityの論文著者

関連著者

• HOSHI Yoichi

  Tokyo Polytechnic University

• LEI Hao

  Tokyo Polytechnic University

• Hoshi Yoichi

  Tokyo Polytechnic University, Atsugi, Kanagawa 243-0297, Japan

• Yasuda Yoji

  Tokyo Polytechnic University, Atsugi, Kanagawa 243-0297, Japan

• Kitahara Naoto

  Tokyo Polytechnic University, Atsugi, Kanagawa 243-0297, Japan

• Yagi Kensuke

  Tokyo Polytechnic University

• SUZUKI Eisuke

  Tokyo Polytechnic University

• SAKAI Akira

  Leading-Edge Technology Development Headquarters, Canon Inc.

• SAWADA Yutaka

  Tokyo Polytechnic University

• Takahashi Tomoki

  Tokyo Polytechnic University

• UCHIDA Takayuki

  Tokyo Institute of Polytechnics

• ICHIKAWA Keisuke

  Tokyo Polytechnic University

• WANG Meihan

  Tokyo Polytechnic University

• Uchida Takayuki

  Tokyo Polytechnic University

• Sawada Yutaka

  Tokyo Institute Of Polytechnique

• Sakai Akira

  Leading-edge Technology Development Headquarters Canon Inc.

• Aoki Wataru

  Tokyo Polytechnic University, Faculty of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Sakai Tetsuya

  Tokyo Polytechnic University, Graduate School of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Hoshi Yoichi

  Tokyo Polytechnic University, Graduate School of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Kuniyoshi Yuji

  Tokyo Polytechnic University, Graduate School of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Ezoe Sho

  Tokyo Polytechnic University, Faculty of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

• Endo Tatsuya

  Tokyo Polytechnic University, Faculty of Engineering, 1583 Iiyama, Atsugi 243-0297, Kanagawa, Japan

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著作論文

• High-Rate Oblique Deposition of SiO_2 Films Using Two Sputtering Sources
• Investigation of Low-Damage Sputter-Deposition of ITO Films on Organic Emission Layer
• High Rate Sputter-Deposition of TiO_2 Films Using Oxide Target(Recent Progress in Oxide Thin Films by Sputtering)
• Special Section on Recent Progress in Oxide Thin Films by Sputtering
• Photocatalytic Characteristics of TiO2 Films Deposited by Oxygen Plasma-Assisted Reactive Evaporation Method
• Control of Nano-Structure of Photocatalytic TiO₂ Films by Oxygen Ion Assisted Glancing Angle Deposition (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
• Control of Nano-Structure of Photocatalytic TiO

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