High-Rate Oblique Deposition of SiO_2 Films Using Two Sputtering Sources

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概要

• 論文の詳細を見る
• 2008-10-01

著者

• Yagi Kensuke

  Tokyo Polytechnic University

• HOSHI Yoichi

  Tokyo Polytechnic University

• SUZUKI Eisuke

  Tokyo Polytechnic University

• LEI Hao

  Tokyo Polytechnic University

• SAKAI Akira

  Leading-Edge Technology Development Headquarters, Canon Inc.

• Sakai Akira

  Leading-edge Technology Development Headquarters Canon Inc.

関連論文

• High-Rate Oblique Deposition of SiO_2 Films Using Two Sputtering Sources
• Investigation of Low-Damage Sputter-Deposition of ITO Films on Organic Emission Layer
• High Rate Sputter-Deposition of TiO_2 Films Using Oxide Target(Recent Progress in Oxide Thin Films by Sputtering)
• Special Section on Recent Progress in Oxide Thin Films by Sputtering
• Photocatalytic Characteristics of TiO2 Films Deposited by Oxygen Plasma-Assisted Reactive Evaporation Method
• Control of Nano-Structure of Photocatalytic TiO₂ Films by Oxygen Ion Assisted Glancing Angle Deposition (SELECTED TOPICS IN APPLIED PHYSICS : Nano Electronics and Devices : Characterization and Control of Nano Surfaces and Interfaces)
• Control of Nano-Structure of Photocatalytic TiO

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