Laser Operation of Nitride Laser Diodes with GaN Well Layer in 340 nm Band
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概要
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We have reported the laser operation of a short-wavelength ultraviolet laser diode with multiple quantum wells composed of GaN well layers. The GaN well-width is estimated to be around 1--1.5 nm. We have simulated whole laser-diode structure, and calculated wave-function overlap integrals. It is provided the integral becomes the maximum value in the well-width of 1.5 nm. The laser operation has been achieved in 340-nm-band under the pulsed current mode at room temperature. The wavelength is far from the wavelength corresponding to band gap of GaN, and the shortest lasing wavelength ever reported for a semiconductor laser composed of binary compound well layer. Moreover, the device has been realized on an Al<inf>0.2</inf>Ga<inf>0.8</inf>N underlying layer with 0.1 lower AlN mole fraction margin than that of a previous reported 342 nm laser-diode with an Al<inf>0.3</inf>Ga<inf>0.7</inf>N underlying layer. These results provide a chance to the next stage for a shorter-wavelength ultraviolet laser diode.
- 2013-08-25
著者
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TORII Kousuke
Hamamatsu Photonics K. K.
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YOSHIDA Harumasa
Hamamatsu Photonics K. K.
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Torii Kousuke
Hamamatsu Photonics K.K., Hamamatsu 434-8601, Japan
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Kuwabara Masakazu
Hamamatsu Photonics K.K., Hamamatsu 434-8601, Japan
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Yamashita Yoji
Hamamatsu Photonics K.K., Hamamatsu 434-8601, Japan
関連論文
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- Short-Pulse Operation of a High-Power-Density Proton-Implanted Vertical-Cavity Surface-Emitting Laser Array
- Growth and Characterization of AlGaN Multiple Quantum Wells for Electron-Beam Target for Deep-Ultraviolet Light Sources
- Short-Pulse Operation of a High-Power-Density Proton-Implanted Vertical-Cavity Surface-Emitting Laser Array
- Laser Operation of Nitride Laser Diodes with GaN Well Layer in 340 nm Band