Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Iida Tetsuya
Research Institute for Microbial Diseases, Osaka University
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Okada Takeru
Research and Development Division, Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan
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Fujimori Jiro
Research and Development Division, Pioneer Corporation, Tokorozawa, Saitama 359-1167, Japan
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- Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process