Electrical Properties of Cr-N Films Deposited by Sputtering : Application to Cryogenic Temperature Sensors (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
著者
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Ishida Takekazu
Department Of Physics And Electronics Osaka Prefecture University
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Sakurai Yoshiaki
Technology Research Institute Of Osaka Prefecture
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KAKEHI Yoshiharu
Technology Research Institute of Osaka Prefecture
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SATOH Kazuo
Technology Research Institute of Osaka Prefecture
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Uno Mayumi
Technology Research Institute of Osaka Prefecture, Izumi, Osaka 594-1157, Japan
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Yotsuya Tsutom
Research Organization for the 21st Century, Osaka Prefecture University, Sakai 599-8531, Japan
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