Low damage etching of polymer materials for depth profile analysis using large Ar cluster ion beam (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))

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概要

• 論文の詳細を見る
• 表面分析研究会の論文

著者

• Ichiki Kazuya

  Department Of Nuclear Engineering Kyoto University

• NINOMIYA Satoshi

  Quantum Science and Engineering Center, Kyoto University

• Ninomiya Satoshi

  Quantum Science And Engineering Center Kyoto University

• Yamada Hideaki

  Department Of Nuclear Engineering Kyoto University

関連論文

• A Processing Technique for Cell Surfaces Using Gas Cluster Ions for Imaging Mass Spectrometry
• Anisotropic Etching Using Reactive Cluster Beams
• Low damage etching of polymer materials for depth profile analysis using large Ar cluster ion beam (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))

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