Growth of perovskite (Bi,Ln)(Ni0.5Ti0.5)O3 thin films by RF magnetron sputtering (Special issue: Ferroelectric materials and their applications)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Fukushima Koji
Department Of Material Science Chemistry Graduate School Of Engineering University Of Hyogo
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Yamaji Toru
Department Of Material Science Chemistry Graduate School Of Engineering University Of Hyogo
関連論文
- Ferroelectric and Memory Characteristics of Pb(Zr_Ti_)O_3 Thin Films Crystallized on PbTiO_3/Pt/SiO_2/Si Substrates by Hot Isostatic Pressing
- Growth of perovskite (Bi,Ln)(Ni0.5Ti0.5)O3 thin films by RF magnetron sputtering (Special issue: Ferroelectric materials and their applications)
- Effects of Applied Strain and Subsequent Heat Treatment at Intermediate Temperature on Mechanical Properties of a Thin Plate Ti-51at% Ni Shape Memory Alloy
- Effects of Hot Isostatic Pressing on Polarization Fatigue Characteristics of Lead-Based Ferroelectric Thin Films Crystallized from the Amorphous State
- Physical Properties of 0.24Pb(Zn_Nb_)O_3・0.384PbZrO_3・0.376PbTiO_3 Thin Films Crystallized by Hot Isostatic Pressing
- Growth of Perovskite (Bi, Ln)(Ni0.5Ti0.5)O3 Thin Films by RF Magnetron Sputtering