Resist removal by using wet ozone

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Yamamoto Masashi

  Kanazawa Inst. Technol. Ishikawa Jpn

関連論文

• Order of Reaction between Photoresist and Atomic Hydrogen Generated by a Tungsten Hot-Wire Catalyst
• Resist removal by using wet ozone
• Substrate Temperature Dependence of the Photoresist Removal Rate Using Atomic Hydrogen Generated by a Hot-Wire Tungsten Catalyst

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