硬質アモルファス窒化炭素薄膜の創製と気相プラズマ診断にもとづく薄膜生成機構の解析
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- 硬質アモルファス窒化炭素薄膜の創製と気相プラズマ診断にもとづく薄膜生成機構の解析
- Hydrogen Storage in Amorphous Phase of Hydrogenated Carbon Nitride
- Quantitative Analysis of Hydrogen in Amorphous Films of Hydrogenated Carbon Nitride : Surfaces, Interfaces, and Films
- Dehydrogenation of Nitrogen-Containing Carbon Films by High-Energy He^ Irradiation
- Deposition of Mechanically Hard Amorphous Carbon Nitride Films with High [N]/([N] + [C]) Ratio
- Measurement of the Active Species Density for the Synthesis of Amorphous Carbon Nitrides I : Metastable Atoms and Electrons in the Microwave Discharge Flow of Ar
- Absolute Density and Sticking Probability of the CN(X^2Σ^+) Radicals Produced by the Dissociative Excitation Reaction of BrCN with the Microwave Discharge Flow of Ar
- Dissociative Excitation Reaction of CH_3CN with the Discharge Flow of Ar : Prediction of the [N]/([N]+[C]) Ratio of Hydrogenated Amorphous Carbon Nitride Films in the Desiccated System
- Roles of Ions and Free Electrons in the Synthesis of Mechanically Hard Amorphous-CNx Films Using a Dissociative Excitation Reaction of BrCN with the Ar Electron Cyclotron Resonance Plasma
- Abrolute Density of the CN(X^2Σ^+),ν = 0 Level Produced by the Dissociative Excitation Reaction of BrCN with the Microwave Discharge Flow of Ar
- Raman Scattering Spectroscopy of Structure of Amorphous Carbon Nitride Films
- Absolute Density and Sticking Probability of the CN(X2Σ〔+〕) Radicals Produced by the Dissociative Excitation Reaction of BrCN with the Microwave Discharge Flow of Ar
- Work Function of Amorphous Carbon Nitride with Various Functional Groups
- Surface Damage of Whisker-Type Cold Emitter after Overload Test
- Threshold Ionization Mass Spectrometry of BrCN: Gas-Phase Reaction Channels Which Determine the Nitrogen Contents in Amorphous Carbon Nitride Films
- Ion-Induced Processes in the Dissociative Excitation Reaction of BrCN to Synthesize Mechanically Hard Amorphous Carbon Nitride Films in the Microwave Plasma Chemical Vapor Deposition System
- Mechanism of Formation of the CN(B^2Σ^+) State from Dissociative Excitation Reaction of BrCN with Electron Cyclotron Resonance Plasma of Ar
- Field Emission Property of Al:ZnO Whiskers Modified by Amorphous Carbon and Related Films : Surfaces, Interfaces, and Films
- Limitation of Nitrogen Incorporation into the Hydrogenated Amorphous Carbon Nitride Films Formed from the Dissociative Excitation Reaction of CH_3CN
- Hardness and Structure of a-CN_x Films Synthesized by Chemical Vapor Deposition
- Mechanism of Nitrogen Incorporation into Amorphous-CN_x Films Formed by Plasma-Enhanced Chemical-Vapor Deposition of the Doublet and Quartet States of the CN Radical
- Synthesis of Amorphous Carbon Nitride Films Using Dissociative Excitation Reaction
- Effect of Substrates on Film Hardness Measurements of Nanometer Thick Amorphous Carbon Films