Theoretical and Experimental Study on the Silylation of Alcohol Units in ArF Lithography Resists
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- Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region
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- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
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- Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193nm Lithography II : Protection Groups Containing an Adamantyl Unit
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