Synthesis and Dissolution Characteristics of Novel Alicyclic Polymers with Monoacid Ester Structures

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Investigation of Acid Catalyzed Insolubilization Reactions for Alicyclic Polymers with Carboxyl Groups
Synthesis and Dissolution Characteristics of Novel Alicyclic Polymers with Monoacid Ester Structures
Micro-Swelling-Free Negative Resists for ArF Phase-Shifting Lithography Utilizing Acid-Catalyzed Intramolecular Esterification
Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
Investigation of Resist Pattern Deformation in Chemical Amplification Resists on SiN_x Substrates
Development of Ammonia Adsorption Filter and Its Application to LSI Manufacturing Environment
Development of High-Performance Negative-tone Resists for 193-nm Lithography
Effect of Comonomer Structure on Dissolution Characteristics: ArF Negative Resist System Using Androsterone Derivative with δ-Hydroxy Acid
Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure with δ-Hydroxy Acid

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