Development of High-Performance Negative-tone Resists for 193-nm Lithography
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関連論文
- Investigation of Acid Catalyzed Insolubilization Reactions for Alicyclic Polymers with Carboxyl Groups
- Synthesis and Dissolution Characteristics of Novel Alicyclic Polymers with Monoacid Ester Structures
- Micro-Swelling-Free Negative Resists for ArF Phase-Shifting Lithography Utilizing Acid-Catalyzed Intramolecular Esterification
- Development of High-Performance Negative-tone Resists for 193-nm Lithography
- Effect of Comonomer Structure on Dissolution Characteristics: ArF Negative Resist System Using Androsterone Derivative with δ-Hydroxy Acid
- Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure with δ-Hydroxy Acid