Fabrication of 200-nm Dot Pattern on 15-m-Long Polymer Sheet Using Sheet Nanoimprint Method
スポンサーリンク
概要
- 論文の詳細を見る
Nanoimprint technology is one of the more promising methods for nano-fabrication. The thermal nanoimprint method can fabricate various kinds of thermoplastic materials and its process consists of heating, pressing, cooling, and separation and a lot of research was reported. We proposed and developed a sheet nanoimprint system that enables for continuous treatment of these four basic steps by introducing a belt-shaped nano-mold. We tried to fabricate dot patterns on polymer films by using a sheet nanoimprint method in this work. A 200 nm in diameter and 240 nm tall dots (aspect ratio 1.4) were formed directly onto a 15-m-long polystyrene film. It is important in the field of industrial applications to fabricate nano-scale patterns over a large area with a high throughput. We demonstrated that the sheet nanoimprint is an attractive method for the direct patterning of nano-scale patterns on thermo-plastic films.
- 2013-03-25
著者
-
Miyauchi Akihiro
Hitachi Research Laboratory Hitachi Ltd.
-
Ogino Masahiko
Hitachi Research Laboratory Hitachi Ltd.
-
Hasegawa Mitsuru
Hitachi Research Laboratory, Hitachi, Ltd., Hitachi, Ibaraki 319-1292, Japan
-
Sakaue Keiji
Nakajo Division, Hitachi Industrial Equipment Systems Co., Ltd., Tainai, Niigata 959-2608, Japan
-
Nagai Shuuichi
Nakajo Division, Hitachi Industrial Equipment Systems Co., Ltd., Tainai, Niigata 959-2608, Japan
-
Miyauchi Akihiro
Hitachi Research Laboratory, Hitachi, Ltd., Hitachi, Ibaraki 319-1292, Japan
関連論文
- Hole Transport in a-Si:H(F) Prepared by Hydrogen-Radical-Assisted Chemical Vapor Deposition
- The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
- Mechanism of Improved Thermal Stability of B in Poly-SiGe Gate on SiON
- Mechanism of Improved Thermal Stability of B in Poly-SiGe Gate on SiON
- Study of X-Ray Reflectivity from Si Film /Interface Layer/Si Substrate and Application to Low-Temperature Epitaxially Grown Si/Si Substrate
- A12-082 NANOPILLARS FABRICATED BY HIGH ASPECT NANOPRINT TECHNOLOGY
- Fabrication of 200-nm Dot Pattern on 15-m-Long Polymer Sheet Using Sheet Nanoimprint Method
- Preparation of Nanopatterned Polyimide by Imprinting and Curing Phenylethynyl- terminated Imide Oligomer