Effects of Deposition Time Duration on Thermal Diffusivity of Hydrogenated Amorphous Carbon Films
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概要
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In the present investigation we study the effects of film-deposition time duration on thermal diffusivity (\alpha) of hydrogenated amorphous carbon (a-C:H) thin-films grown in a radio-frequency (RF) plasma enhanced chemical vapor deposition system. A set of films was deposited at 50 W RF power for 40, 60, 80, and 100 min. Film characteristics were determined from the optical transmission spectroscopy, Fourier Transform Infrared spectroscopy, and Raman spectroscopy. Thermal diffusivity of a-C:H films was evaluated using the optical pump-and-probe technique on the aluminum-coated samples. Results show a trend of increase in \alpha as the deposition time increases due to the microstructural changes associated with longer exposure to ion bombardment effects on the growth surface of the films.
- 2011-12-25
著者
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Kim Yun
Department Of Chemistry Korea Advanced Institute Of Science & Technology
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Krishnaswamy Sridhar
Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, U.S.A.
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Alwi Hasan
School of Applied Physics, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia
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Awang Rozidawati
School of Applied Physics, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia
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