Optimization of Amorphous Si/Crystalline Si Heterojunction Solar Cells by BF2 Ion Implantation
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概要
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In this study we evaluated two approaches to improving the efficiency of amorphous Si/crystalline Si (a-Si/c-Si) heterojunction solar cells by BF2 ion implantation. First, emitter layer formation was compared for the cases of B and BF2 ion implantation when using the same 7° tilt angle. Second, emitter layer formation was compared between a 7° tilt angle and a 60° tilt angle when using BF2 ion implantation. The experimental results reveal that the fluorine in BF2 passivates the defects at the a-Si and a-Si/c-Si interface, and ion implantation at a high 60° tilt angle forms a shallow solar cell junction. The emitter layer formed by BF2 ion implantation with a 60° tilt angle in an a-Si/c-Si heterojunction solar cell achieves the highest short circuit current density (J_{\text{SC}}) of 36.85 mA/cm2 with a conversion efficiency (\eta) of 14.41%.
- 2012-04-25
著者
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Chen Chun-hao
Department Of Applied Chemistry And Chemical Engineering Faculty Of Engineering Kagoshima University
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Wu Yung-chun
Department Of Engineering And System Science National Tsing Hua University
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Chen Chun-Hao
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 300, Taiwan
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Yang Shih-Sian
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 300, Taiwan
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Tsai Tzong-Han
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 300, Taiwan
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Wu Yung-Chun
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 300, Taiwan
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