Fabrication of Molds with 25-nm Dot-Pitch Pattern by Focused Ion Beam and Reactive Ion Etching for Nanoimprint Using Metallic Glass
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概要
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Here we attempted to fabricate molds (dies) of nanodot arrays with a 25-nm pitch and to nanoimprint metallic glass for developing bit-patterned media with an ultrahigh recording density of 1 Tbit/in.2. The mold-fabricating process consisted of mask patterning by focused ion beam assisted chemical vapor deposition (FIB-CVD) and reactive ion etching (RIE). We investigated the feasibility of a Pt-deposited metal etching mask on SiO2 on Si and diamond like carbon (DLC) on Al2O3 substrates, and achieved isolated convex nanodot arrays with a 25-nm pitch and an aspect ratio of 1.8 by RIE with O2 plasma on a DLC/Al2O3 substrate. Subsequently, we nanoimprinted Pt-based metallic glass by using the fabricated molds and successfully replicated fine concave nanohole arrays. The results suggest that the FIB-CVD/RIE process is a promising technique for fabricating ultrafine nanopatterned molds, and metallic glasses are ideal nanoimprintable materials for mass producing nanodevices such as bit-patterned media.
- 2012-08-25
著者
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INOUE Akihisa
Tohoku University
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NISHIYAMA Nobuyuki
RIMCOF Tohoku University Laboratory
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Nishiyama Nobuyuki
RIMCOF Tohoku University Laboratory, The Materials Process Technology Center, Sendai 980-8577, Japan
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Inoue Akihisa
Tohoku University, Sendai 980-8577, Japan
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Saotome Yasunori
Kansai Center, Institute for Materials Research, Tohoku University, Himeji, Hyogo 671-2280, Japan
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Makabe Eiichi
BMG Co., Ltd., Sendai 983-0036, Japan
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Fukuda Yasuyuki
BMG Co., Ltd., Sendai 983-0036, Japan
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Saidoh Noriko
RIMCOF Tohoku University Laboratory, The Materials Process Technology Center, Sendai 980-8577, Japan
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- PREFACE
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- Fabrication of Molds with 25-nm Dot-Pitch Pattern by Focused Ion Beam and Reactive Ion Etching for Nanoimprint Using Metallic Glass
- Microstructures and Mechanical Properties of Highly Electrically Conductive Cu-0.5, Cu-1 and Cu-2 at% Zr Alloy Wires