Role of Impurity Segregation into Cu/Cap Interface and Grain Boundary in Resistivity and Electromigration of Cu/Low-$k$ Interconnects

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概要

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• The role of impurity segregation into the Cu/cap interface and grain boundary is discussed in terms of resistivity and electromigration (EM) lifetime. A Co-based metal capping, a CuAl seed, and new liners (Ti, Zr, and Hf) are compared as technologies for EM lifetime improvement. The roles of impurity in grain growth and electron scattering are investigated by residual resistivity measurement and physical analysis. The EM lifetime distribution and activation energy of lifetime are also investigated. The efficiency of EM improvements is discussed in terms of the trade-off characteristics of each technology during use. The EM improvement efficiency is categorized into three groups.

• 2011-05-25

著者

• Yokogawa Shinji

  Device and Analysis Technology Division, Renesas Electronics Corporation, Sagamihara 229-1198, Japan

• Yokogawa Shinji

  Device & Analysis Technology Division, Renesas Electronics Corporation, Sagamihara 229-1198, Japan

関連論文

• Role of Impurity Segregation into Cu/Cap Interface and Grain Boundary in Resistivity and Electromigration of Cu/Low-$k$ Interconnects
• Thermal Transient Response and Its Modeling for Joule Heating in Cu/Low-κ Interconnects Under Pulsed Current (Special Issue : Advanced Metallization for ULSI Applications)

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