Passivation of Germanium Surfaces by a Quinhydrone--Methanol Solution Treatment
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概要
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The bulk lifetime of minority carriers, $\tau_{\text{b}}$, in germanium (Ge) is one of the most important material parameters in the design and fabrication of Ge-based solar cells. Surface passivation of Ge substrates is indispensable to the accurate evaluation of $\tau_{\text{b}}$. We have found that a newly developed wet chemical treatment, quinhydrone--methanol (Q/M) solution treatment, effectively passivates Ge surfaces, achieving a surface recombination velocity ($S$) of less than 20 cm/s. It has been clarified that oxide layers containing the molecules from the Q/M solution were formed on the Ge surfaces treated with the Q/M solution. Ge dangling bonds (DBs) are thought to be terminated by these oxygen related molecules. Band bending in the Ge substrates induced by the oxide layers adsorbed on the Q/M-treated Ge surface can contribute to the reduction in $S$. We also briefly discuss the properties of a recombination center found in the bulk of highly resistive Ge substrates.
- 2011-07-25
著者
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Swain Bibhu
Research Center For Photovoltaics National Institute Of Advanced Industrial Science And Technology A
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Sakata Isao
Research Center For Photovoltaics National Institute Of Advanced Industrial Science And Technology A
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Takato Hidetaka
Research Center For Photovoltaics National Institute Of Advanced Industrial Science And Technology A
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Swain Bibhu
Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Takato Hidetaka
Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Sakata Isao
Research Center for Photovoltaic Technologies, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
関連論文
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