Reaction Kinetics in the Rapid Oxide Growth on Si(001)-($2{\times}1$) Probed with Reflectance Difference Spectroscopy
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概要
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We investigated the NO adsorption process on Si(001)-($2{\times}1$) and the oxygen adsorption process on potassium-covered Si(001)-($2{\times}1$) by reflectance difference spectroscopy (RDS). In both cases, the time courses that deviated from a simple Langmuirian kinetics could not be well fitted with a single exponential function, indicating the involvement of two different processes. In NO adsorption, a highly coordinated nitrogen adsorption site (N$\equiv$Si3) might play a role in the initial reaction process, producing an inhomogeneous strain on the first layer of oxynitride. In potassium-assisted oxidation, a sudden decrease in RD intensity just after oxygen exposure is associated with a reaction of oxygen with a potassium film, and the subsequent oxidation is slightly enhanced by the potassium–oxygen complex.
- 2010-05-25
著者
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Ohno Shin-ya
Department Of Physics Faculty Of Engineering Yokohama National University
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Morimoto Masahiro
Department Of Anesthesiology Kinki University School Of Medicine
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Masatoshi Tanaka
Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Takanori Suzuki
Department of Applied Physics, School of Applied Sciences, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan
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Ochiai Toshiyuki
Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Ken-ichi Shudo
Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Toshiyuki Ochiai
Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Shin-ya Ohno
Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Masahiro Morimoto
Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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