Creation of a Degraded Layer on the Surface of Photoresist by Radical Irradiation
スポンサーリンク
概要
- 論文の詳細を見る
A novel mechanism of the inclination of a photoresist mask based on the experimental evaluation of the change in the quality of the irradiated surface layer of a material was proposed. In this proposed mechanism, the irradiation of oxygen and fluorine radicals generates a very thin degraded surface layer with a high tensile stress and causes the inclination of the mask. It was found that a very thin (approximately 5 nm thick) layer with a high tensile stress appeared after the irradiation of radicals on the surface of the photoresist mask. X-ray photoelectron spectroscopy (XPS) confirmed that irradiation of either of these radicals generates a very thin degraded layer on the photoresist surface.
- 2010-04-25
著者
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Miura Hideo
Fracture And Reliability Research Institute Graduate School Of Engineering Tohoku University
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Hideo Miura
Fracture and Reliability Research Institute, Graduate School of Engineering, Tohoku University, 6-6-11-712 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Naoyuki Kofuji
Hitachi, Ltd., Central Research Laboratory, 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Kofuji Naoyuki
Hitachi, Ltd., Central Research Laboratory, 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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MIURA Hideo
Fracture and Reliability Research Institute (FRRI), Graduate School of Engineering, Tohoku University
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