An Extreme Ultraviolet Source for Photolithographic Applications Based on Rotamak Discharge
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概要
- 論文の詳細を見る
Xenon plasma produced in the Kansai Rotamak has been used to generate about 66 W of extreme ultraviolet (EUV) radiation. The plasma in the Kansai Rotamak is produced using a rotating magnetic field (RMF) generated using a pair of 200 kHz/180 kW oscillators. The plasma can be sustained for a period of 5 ms limited only by the duration of applied RMF. The rotamak plasma discharge is electrodeless and its geometry is sufficiently simple to allow easy access to the emitted EUV radiation.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2010-01-25
著者
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Ohnishi Masami
Department of Electrical and Electronic Engineering, Faculty of Engineering Science, Kansai University, 3-3-35 Yamate-cho, Suita, Osaka 564-8680, Japan
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Hugrass Waheed
School of Computing and Information Systems, University of Tasmania, Locked Bag 1359, Launceston, Tasmania 7250, Australia
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Chikano Tomonori
Department of Electrical and Electronic Engineering, Faculty of Engineering Science, Kansai University, 3-3-35 Yamate-cho, Suita, Osaka 564-8680, Japan
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Tsukamoto Masanobu
Department of Electrical and Electronic Engineering, Faculty of Engineering Science, Kansai University, 3-3-35 Yamate-cho, Suita, Osaka 564-8680, Japan
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- An Extreme Ultraviolet Source for Photolithographic Applications Based on Rotamak Discharge