Effect of Ar and N2 Plasma Pretreatment with Biased Sample Holder on Amino Group Introduction Onto Polyethylene Sheet Treated by Ammonia Plasma
スポンサーリンク
概要
- 論文の詳細を見る
The effect of the plasma pretreatment using a biased sample holder on amino group introduction onto a polyethylene (PE) surface is reported. Ar or N2 plasma was used for the pretreatment and was followed by ammonia plasma treatment for 30 s. X-ray photoelectron spectroscopy (XPS) and chemical derivatization were used in order to estimate the concentration of the introduced amino group. In both cases of plasma pretreatment, the reactivity of the surface increased, and the overall nitrogen concentration on the PE surface increased. In the case of Ar pretreatment, we observed no significant change in amino group introduction compared with that without pretreatment, whereas in the case of N2 pretreatment, the concentration of amino groups decreased by about 40%.
- 2008-09-25
著者
-
Ogino Akihisa
Graduate School Of Electronic Science And Technology Shizuoka University
-
Kral Martin
Graduate School Of Electronic Science And Technology Shizuoka University
-
Král' Martin
Graduate School of Electronic Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan
-
Nagatsu Masaaki
Graduate School of Electronic Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan
-
Ogino Akihisa
Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
関連論文
- Production of Vanadium-Carbon Clusters Using DC Arc Discharges with Pulsed Helium/Methane Gas Injection
- Field-Emission Characteristics of Hydrogenated Amorphous Carbon Films Prepared by Surface Wave Plasma
- Amino-group introduction on polymer surface using time-modulated surface-wave plasma
- Study of Inactivation Factors in Low Temperature Surface-wave Plasma Sterilization
- Field-Emission Properties of Nanostructured WO3 Arrays Fabricated Using Tungsten Hot-Filament Chemical Vapor Deposition
- Role of Negative Electric Field Biasing on Growth of Vertically Aligned Carbon Nanotubes Using Chemical Vapor Deposition
- Effect of Ar and N2 Plasma Pretreatment with Biased Sample Holder on Amino Group Introduction Onto Polyethylene Sheet Treated by Ammonia Plasma
- Cathodoluminescence Property of ZnO Nanophosphors Prepared by Laser Ablation
- Low-Temperature Nitrogen Introduction onto Polyurethane Surface Using Surface-Wave Excited N2/H2 Plasma
- Effects of Nitrogen and Oxygen Radicals on Low-Temperature Bio-Molecule Processing
- Optimization of Amino Group Introduction onto Polyurethane Surface Using Ammonia and Argon Surface-Wave Plasma
- Immobilization of l-Cysteine onto Poly(ethylene glycol) Polymerized by Surface-Wave Plasma
- Effects of Illumination on Thermionic Energy Converter Characteristics
- Effects of N2-O2 gas mixture ratio on microorganism inactivation in low-pressure surface wave plasma (Special issue: Plasma processing)
- Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H_2 Atmospheric Pressure Plasma Jet
- Effect of Water Vapor Addition on the Microwave-Excited Ar Plasma-Induced Poly(ethylene glycol) Polymerization and Immobilization of L-Cysteine
- Effect of Hole Structures on Discharge Characteristics of Planar Dielectric Barrier Electrodes with Non-through Micro-holes