Low-Temperature Nitrogen Introduction onto Polyurethane Surface Using Surface-Wave Excited N2/H2 Plasma
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概要
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In this article, we report the results of the low-temperature chemical modification of a polyurethane (PU) surface using surface-wave excited N2/H2 plasma. Optical emission spectroscopy (OES) and double-probe measurement were performed to obtain optimum plasma properties. X-ray photoelectron spectroscopy (XPS) was employed to characterize the changes on the PU surface and to estimate the amount of introduced nitrogen-containing groups. The result shows that the largest amount of increase was obtained in the case of 90% $\text{N$_{2}$}/(\text{N$_{2}$} + \text{H$_{2}$})$ plasma where the N/C ratio on the PU surface increased from 0.0128 before plasma treatment to 0.131 after plasma treatment.
- 2007-11-15
著者
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NARUSHIMA Kazuo
Faculty of Engineering, Shizuoka University
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Ogino Akihisa
Graduate School Of Electronic Science And Technology Shizuoka University
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Kral Martin
Graduate School Of Electronic Science And Technology Shizuoka University
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Yamashita Mitsuji
Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
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Nagatsu Masaaki
Graduate School of Electronic Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
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Nagatsu Masaaki
Graduate School of Electronic Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan
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Inagaki Norihiro
Faculty of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
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Kral Martin
Graduate School of Electronic Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
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