Effect of Reaction Temperature on Growth of Organosilane Self-Assembled Monolayers

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概要

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• The effect of reaction temperature on the self-organization and growth mechanism of octadecyltrichlorosilane (OTS) self-assembled monolayers (SAM) was investigated by atomic force microscopy (AFM), grazing incidence X-ray diffraction (GIXD) measurement, Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS). OTS SAM was prepared by a liquid phase method and chemical vapor deposition. In the liquid phase method, OTS SAM was prepared in the temperature range from 5 to 40 °C. In the reaction temperature range from 5 to 30 °C, OTS molecules formed domain structures early in the growth process and grew two-dimensionally on SiO2 substrates. In addition, the crystalline peaks of GIXD measurements indicated that OTS SAM prepared at lower temperatures (5–30 °C) grew in the crystalline state. Thus, “self-organization” occurred under these conditions. However, OTS SAM prepared at 40 °C showed an amorphous structure. XPS and FT-IR spectra showed that the SiO2 peak increased while reaction temperature decreased. These results indicated that the formation of a siloxane bond between OTS molecules was important for the self-organization of the OTS monolayer. In addition, FT-IR measurement indicated that the packing density of the OTS monolayer prepared at lower temperatures was higher than that prepared at higher temperatures by chemical vapor deposition.

• 2008-08-25

著者

• Takai Osamu

  Ecotopia Science Institute Nagoya University

• Saito Nagahiro

  Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University

• Lee Sunhyung

  Faculty of Engineering, Shinshu University, Wakasato, Nagano 380-8553, Japan

• Ishizaki Takahiro

  Materials Research Institute for Sustainable Development, National Institute of Advanced Industrial Science and Technology, 2266-98, Anagahora, Shimo-Shidami, Moriyama, Nagoya 463-8560, Japan

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