Nanodimple Arrays Fabricated on SiO2 Surfaces by Wet Etching through Block Copolymer Thin Films
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概要
- 論文の詳細を見る
Block copolymer thin films are promising nanotemplates because highly ordered periodic structures are spontaneously formed through microphase separation on a deca-nanometer scale and over a large area. An amphiphilic block copolymer, which consists of poly(ethylene oxide) (PEO) and poly(methacrylate) (PMA) with azobenzene mesogens and is denoted by PEOm-$b$-PMA(Az)n, indicates a strong chemical contrast between the corresponding microdomains, which offer structurally reliable nanotemplates for fabricating nanostructured materials. Thermally annealing a PEOm-$b$-PMA(Az)n thin film provides hexagonally arranged, perpendicularly oriented PEO cylinders, which perform as ion-conductive nanochannels. In this study, a SiO2 layer on a silicon wafer substrate is etched by NH4F through a PEO114-$b$-PMA(Az)54 thin film as a nanomask. The SiO2 layer is patterned with a 24-nm-periodic hexagonally arranged nanodimple array. Atomic force microscope (AFM), field emission scanning electron microscope (FESEM), and cross-sectional transmission electron microscope (TEM) observations reveal that the nanodimple array has a 2-nm depth and is spread over the entire SiO2 surface on centimeter scale.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-06-25
著者
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Iyoda Tomokazu
Division Of Integrated Molecular Engineering Chemical Resources Laboratory Tokyo Institute Of Technology
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Kamata Kaori
Division Of Integrated Molecular Engineering Chemical Resources Laboratory Tokyo Institute Of Technology
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Watanabe Ryoko
Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Kamata Kaori
Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Iyoda Tomokazu
Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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WATANABE Ryoko
Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology
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