Extreme Ultraviolet Lithography Using Small-Field Exposure Tool: Current Status
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概要
- 論文の詳細を見る
The small-field exposure tool (SFET) for extreme ultraviolet (EUV) lithography was manufactured by Canon and EUVA and installed in Selete. It is being used for developing mask, resist, and tool technologies. In this paper, we review the current status of SFET development and present some initial results on lithographic performance and tool stability.
- 2008-06-25
著者
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Tanaka Hiroyuki
Semiconductor Device Research Center Semiconductor Company Matsushita Electric Industrial Co. Ltd.
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Tanaka Yuusuke
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
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Tanaka Hiroyuki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shirai Seiichiro
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tawarayama Kazuo
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Magoshi Shunko
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tanaka Yuusuke
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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