A Characterization of Endurance in 64 Mbit Ferroelectric Random Access Memory by Analyzing the Space Charge Concentration
スポンサーリンク
概要
- 論文の詳細を見る
Space charge concentration due to fatigue cycles was examined with an adequate modeling in order to expect read/write endurance of a 64 Mbit one-transistor and one-capacitor (1T1C) ferroelectric random access memory (FRAM). For monitoring the change in space charge concentration according to fatigue cycles, we assumed that our ferroelectric capacitor is governed by a partially depleted Schottky conduction model. With this, the space charge concentration at the each decade of the fatigue cycles was calculated by measuring the current–voltage characteristics. The space charge concentration at the initial stage was evaluated into $1.95 \times 10^{20}$ and $2.16 \times 10^{20}$/cm3 after the $10^{11}$ cycles. The concentration of $2.29 \times 10^{20}$/cm3 was expected at the fatigue cycles of $10^{16}$ through a linear regression of the concentration plot against fatigue cycles. Accordingly, it could be said that our ferroelectric capacitor has few problems of endurance up to the $10^{16}$ cycles considering the concentration of ${\sim}10^{20}$ and the film thickness of 80 nm. Other empirical data obtained in the capacitor level after full integration are supporting this expectation as well.
- 2008-04-25
著者
-
Kim Jae
Advanced Semiconductor Research Center Department Of Electronics And Computer Engineering Hanyang Un
-
Kim Hyun
Advanced Mobile Technology Research Center Korea Electronics Technology Institute (keti)
-
Park Jung
Advanced Display Research Center Kyung Hee University
-
Hong Young
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kang Young
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Lee Eun
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jung Dong
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kang Seung
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kim Hee
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jung Won
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Ahn Woo
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jung Ju
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kang Jin
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Choi Do
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Goh Han
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kim Song
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Lee Sang
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jeong Hong
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Goh Han
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Ahn Woo
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jung Dong
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jung Ju
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kim Hee
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Choi Do
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kim Song
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kang Seung
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jung Won
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Park Jung
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Jeong Hong
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Lee Sang
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
-
Kang Jin
Advanced Technology Team 2, Semiconductor R&D center, Samsung Electronics Co., Ltd., San #24, Nonseo-dong, Giheung-gu, Yongin, Gyunggi 446-711, Korea
関連論文
- Performance of DVB-S2 System in a Land Mobile Satellite Channel
- Bipolar Host Materials for Green Triplet Emitter in Organic Light-emitting Diodes
- Unique Multilevel Flash Memory Devices Operating at High Programming Speed, Designed Utilizing Novel Asymmetric Gates
- Unique Multilevel Flash Memory Devices Operating at High Programming Speed, Designed Utilizing Novel Asymmetric Gates
- A Characterization of Endurance in 64 Mbit Ferroelectric Random Access Memory by Analyzing the Space Charge Concentration
- Enhancement of Seebeck Coefficient in Bi0.5Sb1.5Te3 with High-Density Tellurium Nanoinclusions