Low-Resistivity Bi2Sr2CaCu2O8+δ/Au Contacts for Fabrication of Stacked Intrinsic Josephson Junctions

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概要

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• We investigated the specific contact resistivity ($\rho_{\text{c}}$) of a Bi2Sr2CaCu2O8+δ (Bi-2212)/Au interface for the fabrication of high-quality intrinsic Josephson junctions (IJJs). The Bi-2212 single crystal was grown using a self-flux method. The Au film was deposited on the freshly cleaved crystal surface by RF magnetron sputtering using different vacuum chambers with different background pressures ($P_{\text{BP}}= 6.7\times 10^{-3}$, $8.0\times 10^{-4}$, and $1.1\times 10^{-4}$ Pa). For $P_{\text{BP}}= 6.7\times 10^{-3}$ Pa, the substrate temperature ($T_{\text{s}}$) dependence of the $\rho_{\text{c}}$ was studied. The measurement of $\rho_{\text{c}}$ was carried out at room temperature. $\rho_{\text{c}}$ decreased with an increase in $T_{\text{s}}$, and reached $2\times 10^{-3}$ $\Omega$ cm2 at $T_{\text{s}} =150$ °C. This result may explain the Au particle diffusion in the Bi-2212 crystal induced by self-heating during deposition. We also measured the $P_{\text{BP}}$ dependence of $\rho_{\text{c}}$. $\rho_{\text{c}}$ decreased with a decrease in $P_{\text{BP}}$, and reached $8\times 10^{-5}$ $\Omega$ cm2 for $P_{\text{BP}}=1.1\times 10^{-4}$ Pa. We suggest that the adsorption of residual moisture on the cleaved Bi-2212 surface is the dominant cause of the degradation of $\rho_{\text{c}}$. In our research, $8\times 10^{-5}$ $\Omega$ cm2 was the minimum value. Finally, we fabricated a stacked Bi-2212 Josephson junction (Bi-2212 stack) using a self-planarizing process. The $\rho_{\text{c}}$ of these stacks was $8\times 10^{-5}$ $\Omega$ cm2 in the temperature range from 4.2 to 77 K. This value was smaller than the target value, i.e., $\rho_{\text{c}}=1\times 10^{-3}$ $\Omega$ cm2.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-02-25

著者

• Ishida Hiroki

  Department Of Electrical And Electronic Engineering Kobe University

• Hamasaki Katsuyoshi

  Department Of Electrical Engineering Nagaoka University Of Technology

• Kato Takahiro

  Department Of Cardiology Keio University School Of Medicine

• Ishida Hiroki

  Department of Electronic Control Engineering, Toyama National College of Maritime Technology, 1-2 Ebie-Neriya, Imizu, Toyama 933-0293, Japan

• Hachiga Tadashi

  Department of Electronic Control Engineering, Toyama National College of Maritime Technology, 1-2 Ebie-Neriya, Imizu, Toyama 933-0293, Japan

• Ishida Hiroki

  Department of Chemistry and Biochemistry, Graduate School of Engineering,, Kyushu University

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