Selective-Area Micropatterning of Liquid-Phase Epitaxy-Grown Iron Garnet Films
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概要
- 論文の詳細を見る
We investigated selective-area micropatterning of iron garnet film grown by liquid-phase epitaxy (LPE). This method of producing a flat-surface structure overcomes the disadvantages of geometrical grooves, which are formed by wet or dry etching, with a limited resolution due to underetching and nonplanar structure. Moreover, patterned iron garnet films grown by selective-area LPE have better single-crystal properties than films grown by selective-area sputter epitaxy deposition. Thus, this method offers new possibilities for the fabrication of integrated magnetooptic light switch arrays, magnetic waveguides and other magnetooptic devices.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-07-15
著者
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Park Jae-hyuk
Department Of Electrical & Electronic Engineering Toyohashi University Of Technology
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Cho Jae-kyeong
Department Of Electronic Materials Engineering Gyeongsang National University
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Inoue Mitsuteru
Department Of Electrical & Electronic Engineering Toyohashi University Of Technology
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Uchida Hironaga
Department Of Electrical & Electronic Engineering Toyohashi University Of Technology
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Nishimura Kazuhiro
Department Of Applied Science Faculty Of Engineering Kyushu University
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Inoue Mitsuteru
Department of Electric and Electronic Engineering, Toyohashi University of Technology, Tempaku, Toyohashi, Aichi 441-8580, Japan
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Nishimura Kazuhiro
Department of Electrical & Electronic Engineering, Toyohashi University of Technology, 1-1 Hibari-Ga-Oka, Tempaku, Toyohashi 441-8580, Japan
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Uchida Hironaga
Department of Electric and Electronic Engineering, Toyohashi University of Technology, Tempaku, Toyohashi, Aichi 441-8580, Japan
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