Patterned Pyroelectric Electron Emitters and their Feasibility Study for Lithography Applications
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概要
- 論文の詳細を見る
Patterned electron emitters were fabricated using LiNbO3 (LN) single crystals and their characteristics were investigated for electron-beam lithography applications. Pyroelectrically induced electron emission was suppressed by coating Pt and Ti thin films. However, the electron emission behaviors were not affected by the deposition of SiO2 dielectric layers. Based on these observations, a structure of patterned emitters was suggested; Ti layers and SiO2 layers were used as blocking layers and emission layers, respectively. By using a $1:1$ electron beam projection system, 100 μm and 5 μm dots on the exposed resist were obtained from 300 μm and 30 μm dots on emitters. Reduction of patterns might be useful in obtaining fine patterns without complex electron optics.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Ko Tae
Department Of Electrical And Electronic Engineering Yonsei University
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MOON Chang-Wook
Samsung Advanced Institute of Technology
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KIM Dong-Wook
Samsung Advanced Institute of Technology
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YOO In
Samsung Advanced Institute of Technology
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Rosenman G.
Department Of Electrical Engineering-physical Electronics Tel Aviv University
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Kim Dong-Wook
Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, Kyongki-do 440-600, Korea
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Moon Chang-Wook
Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, Kyongki-do 440-600, Korea
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Ko Tae
Department of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea
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Yoo In
Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, Kyongki-do 440-600, Korea
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