Pulsed Laser Deposition of TiNi Thin Films at Various Temperatures
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概要
- 論文の詳細を見る
Thin films of TiNi shape memory alloy (SMA) have been prepared by pulsed-laser deposition (PLD) at various substrate temperatures. X-ray photoelectron spectroscopy (XPS), surface profile measurements, and X-ray diffraction (XRD) are used to characterize the deposited films. The stoichiometry, deposition rate, and crystallinity of the films are investigated as functions of the substrate temperature. The deposition rates are of the order of $10^{-2}$ nm per pulse. The Ni content ranges from 46.7 to 52.0 at.%. It is found that the film deposited at a substrate temperature of 600°C has a polycrystalline structure and austenite is the major phase. It can be concluded that substrate temperature plays an important role in the composition control and the crystallization of the films. The martensitic transformation temperature of the annealed Ti–51.5 at.% Ni thin film is determined to be $-20.8$°C by differential scanning calorimetry (DSC).
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2001-09-15
著者
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Lu Yong-feng
Laser Microprocessing Lab. Department Of Electrical Engineering And Data Strong Institute National U
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Liew Thomas
Laser Microprocessing Laboratory Department Of Electrical Engineering And Data Storage Institute Nat
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Wang Jian-ping
Laser Microprocessing Laboratory Department Of Electrical Engineering And Data Storage Institute Nat
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Ren Zhong-min
Laser Microprocessing Laboratory Department Of Electrical Engineering And Data Storage Institute Nat
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Chen Xiao-yu
Laser Microprocessing Laboratory Department Of Electrical Engineering And Data Storage Institute Nat
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Zhu Sha
Laser Microprocessing Laboratory Department Of Electrical Engineering And Data Storage Institute Nat
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Zhu Sha
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Wang Jian-Ping
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Liew Thomas
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Chen Xiao-Yu
Laser Microprocessing Laboratory, Department of Electrical Engineering and Data Storage Institute, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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