Deposition of High-Quality TiO 2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet

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概要

• 論文の詳細を見る

• RF magnetron sputtering with an auxiliary permanent magnet was applied for the deposition of TiO2 films. An auxiliary magnet was installed under a grounded electrode and the magnetic field strength was intensified in the whole discharge space. The film prepared by this sputtering apparatus showed a high value of the refractive index equal to that of bulk TiO2 crystal. The results of several diagnostic techniques showed characteristic changes in the discharge structure. It was shown that a high current of substrate-incident ions brings about growth of high-quality TiO2 films.

• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-30

著者

• OKIMURA Kunio

  Fukui National College of Technology

• SHIBATA Akira

  Fukui National College of Technology

• Okimura Kunio

  Fukui National College of Technology, Geshicho, Sabae, Fukui 916, Japan

関連論文

• Mass and Energy Analyses of Substrate-incident Ions in TiO_2 Deposition by RF Magnetron Sputtering
• Preparation of Rutile TiO_2 Films by RF Magnetron Sputtering
• Role of He Gas Mixture on the Growth of Anatase and Rutile TiO_2 Films in RF Magnetron Sputtering
• Deposition of TiO_2 Films by Reactive Sputtering in Magnetic Field
• Deposition of High-Quality TiO 2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet

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