Deposition of TiO_2 Films by Reactive Sputtering in Magnetic Field

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概要

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• When TiO_2 films are deposited on a Si substrate, the mangetic screening of the substrate is proposed to reduce the deep-level trap by Ti atom bombardment. The substrate is placed in the field of a permanent magnet. It is found that the films deposited with the magnet do not form any deep level in the substrate, and exhibit better optical property and crystalline structure than those deposited without the magnet.

• 社団法人応用物理学会の論文
• 1991-04-01

著者

• SHIBATA Akira

  Fukui National College of Technology

• Shibata Akira

  Fukui National College Technology

関連論文

• Mass and Energy Analyses of Substrate-incident Ions in TiO_2 Deposition by RF Magnetron Sputtering
• Preparation of Rutile TiO_2 Films by RF Magnetron Sputtering
• Role of He Gas Mixture on the Growth of Anatase and Rutile TiO_2 Films in RF Magnetron Sputtering
• Deposition of TiO_2 Films by Reactive Sputtering in Magnetic Field
• Deposition of High-Quality TiO 2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet

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