Mass and Energy Analyses of Substrate-incident Ions in TiO_2 Deposition by RF Magnetron Sputtering

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-01-01

著者

• Shibata A

  Taiko Tec Co. Osaka Jpn

• OKIMURA Kunio

  Fukui National College of Technology

• SHIBATA Akira

  Fukui National College of Technology

関連論文

• Mass and Energy Analyses of Substrate-incident Ions in TiO_2 Deposition by RF Magnetron Sputtering
• Preparation of Rutile TiO_2 Films by RF Magnetron Sputtering
• Enantioselective Hydrogenation of(E)-α-Phenylcinnamic Acid on Pd/TiO_2 Catalyst Modified by Cinchona Alkaloids:Effect of Modifier Structure
• Reinvestigation of Decarboxylation Kinetics from the Hydrogencarbonatocobalt(III) Intermediate
• Role of He Gas Mixture on the Growth of Anatase and Rutile TiO_2 Films in RF Magnetron Sputtering
• Deposition of TiO_2 Films by Reactive Sputtering in Magnetic Field
• Deposition of High-Quality TiO 2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet

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