Self-Epitaxial Growth of Metastable A15 V3Al on Au-Coated Sapphire Substrates

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概要

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• The metastable A15 V3Al phase was obtained on glazed alumina (glass-coated alumina) and Au-coated sapphire substrates by sputtering using a composite target of Al and V. However, the metastable phase was not formed on sapphire or Ag-coated sapphire substrates. From the depth profile of the composition of the films prepared on glazed alumina substrates, it was found that Si and Ca atoms diffused into V–Al films from the glazed alumina substrate forming an A15 V3(Si, Ca) layer. The metastable A15 V3Al phase was grown self-epitaxially on such layers. The $T_{\text{c}}$ value of the A15 V3Al prepared on glazed alumina substrates was higher than that prepared on Au-coated sapphire substrates. The maximum $T_{\text{c}}$ of 13.8 K was obtained for the films prepared on glazed alumina substrates.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1989-08-20

著者

• ISHIDA Hiroyuki

  Faculty of Science, Okayama University

• Okuyama Katsuro

  Faculty Of Engineering Yamagata University

• Ohshima Shigetoshi

  Faculty Of Engineering Yamagata University

• Wakiyama Tokuo

  Faculty of Engineering, Electronic Engineering, Tohoku University, Sendai 982

• Ohshima Shigetoshi

  Faculty of Engineering, Electronic Engineering, Yamagata University, Yonezawa 992

• Ishida Hiroyuki

  Faculty of Engineering, Electronic Engineering, Tohoku University, Sendai 982

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