Electrical and Chemical Properties of Photo-Cross-Linked Polymeric Insulating Materials

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概要

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• Photosensitive polymeric insulating films, which were prepared by mixing host polymers and a photosensitizer, exhibit high chemical resistance and excellent electrical properties. These polymer films formed by the spin-coating method were exposed through a mask to patterned radiation of UV light. The nonexposed areas of these films were dissolved by an appropriate solvent. Leakage current densities for these films are very low, approximately $5 \times 10^{-7} \sim 3 \times 10^{-8}$ A/cm2 at a bias of 10.0 V. These polymer insulators are particularly suitable for plastic-based electronic device applications.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2005-03-10

著者

• YOON Sung-Min

  Basic Research Laboratory, Electronics & Telecommunications Research Institute (ETRI)

• SUH Kyung

  Basic Research Laboratory, Electronics and Telecommunications Research Institute

• Kim Gi

  Basic Research Lab. Electronics And Teleconumunications Research Institute

• Kim Chul

  Basic Research Laboratory Electronics And Telecommunications Research Institute

• Yoon Sung-Min

  Basic Research Laboratory, Electronics and Telecommunications Research Institute, 161 Gajeong-Dong, Yuseong-Gu, Daejeon, 305-350, Korea

• Suh Kyung

  Basic Research Laboratory, Electronics and Telecommunications Research Institute, 161 Gajeong-Dong, Yuseong-Gu, Daejeon, 305-350, Korea

• Kim Gi

  Basic Research Laboratory, Electronics and Telecommunications Research Institute, 161 Gajeong-Dong, Yuseong-Gu, Daejeon, 305-350, Korea

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