Low-reflective Wire-grid Polarizers with an Absorptive Layer Formed by Glancing Angle Deposition
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概要
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We have developed wire-grid polarizers with low reflectivity in the visible region. The polarizers consist of a bilayered structure of an absorptive layer and a (transparent) gap layer on sub-wavelength pitch gratings made of aluminum. The bilayered structure functions as a highly effective antireflection coating for wire-grid with high reflectance. In order to realize these multilayered wire-grid, the glancing angle deposition technique was used to deposit the absorptive layer just above the Al wire-grid covered with the SiO2 gap layer. Both low reflectance and high transmittance in the desired wavelength range were achieved by optimizing the thickness of each layer.
著者
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TAKADA Akio
R&D Division, Sony Chemical & Information Device Corporation
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SASAKI Koji
R&D Division, Sony Chemical & Information Device Corporation
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TAKAHASHI Eiji
R&D Division, Sony Chemical & Information Device Corporation
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HANASHIMA Naoki
R&D Division, Sony Chemical & Information Device Corporation
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YAMADA Takatoshi
R&D Division, Sony Chemical & Information Device Corporation
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Suzuki Motofumi
Department of Micro Engineering, Kyoto University
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YAMADA Takatoshi
R&D Division, Sony Chemical & Information Device Corporation
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Suzuki Motofumi
Department of Engineering Physics and Mechanics, Kyoto University, Kyoto 606-8501, Japan
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