The mercury-photosensitized reaction of hydrogen with nitric oxide.

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概要

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• The Hg-photosensitized reaction of a mixture of H<SUB>2</SUB> and NO has been studied mainly at room temperature. The quantum yield of the H<SUB>2</SUB>O formation is nearly unity, independent of the pressures of both H<SUB>2</SUB> and NO. The quantum yield of the N<SUB>2</SUB> formation is proportional to the NO pressure, while that of N<SUB>2</SUB>O decreases with the NO pressure; both of them are independent of the H<SUB>2</SUB> pressure. In order to interpret the results concerning the H<SUB>2</SUB>O formation, the following process is proposed:<BR>(i) NO<SUB>3</SUB>+NO→2NO<SUB>2</SUB><BR>NO<SUB>2</SUB>+HNO→OH+2NO<BR>OH+HNO→H<SUB>2</SUB>O+NO<BR>in addition to the well-established H<SUB>2</SUB>O-forming process:<BR>(ii) 2HNO→H<SUB>2</SUB>O+N<SUB>2</SUB>O<BR>NO<SUB>2</SUB>, one of the reactants in Process (i), is formed by the chain process proposed by Arden and Phillips:<BR>(iii) H+NO+M→HNO+M<BR>HNO+2NO→N<SUB>2</SUB>+H+NO<SUB>3</SUB><BR>The (ii) and (iii) processes also coincide with the results of the N<SUB>2</SUB>O and N<SUB>2</SUB> formations respectively.

• 公益社団法人 日本化学会の論文

著者

• Tadasa Kohji

  Faculty of Liberal Arts and Sciences, University of Osaka Prefecture

• Imai Naomi

  Faculty of Liberal Arts and Sciences, University of Osaka Prefecture

• Inaba Tetsuo

  Faculty of Liberal Arts and Sciences, University of Osaka Prefecture

関連論文

• Photolysis of formaldehyde in the presence of nitric oxide.
• The Thermal Decomposition of Formaldehyde in the Presence of Nitric Oxide
• Thermal decomposition of dimethyl ether in the presence of nitrogen oxide.
• The Thermal Reaction of Hydrogen and Nitric Oxide
• The mercury-photosensitized reaction of hydrogen with nitric oxide.

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