Photolysis of formaldehyde in the presence of nitric oxide.

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概要

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• The photolysis of CH<SUB>2</SUB>O has been studied in the absence and presence of NO from room temperature to 300°C. In the photolysis of CH<SUB>2</SUB>O alone, the CO and H<SUB>2</SUB> formation rates increase greatly with temperature. When NO is added, these rates vary and reach constant values with an increase in the amount of NO. These limiting rates are independent of the temperature to within the experimental error, in contrast to the rates observed for CH<SUB>2</SUB>O alone. It is suggested that the limiting rate of CO formation corresponds to the sum of the rates of the two primary processes, the molecular and radical reactions, and that that of H<SUB>2</SUB> formation corresponds to the rate of the molecular process. For photolysis totally inhibited by NO, the rates of formation of CO, H<SUB>2</SUB>, N<SUB>2</SUB>, and N<SUB>2</SUB>O were examined and a reaction mechanism is proposed which is consistent with that for the photosensitized reaction between hydrogen and nitric oxide previously studied in this laboratory.

• 公益社団法人 日本化学会の論文

著者

• Tadasa Kohji

  Faculty of Liberal Arts and Sciences, University of Osaka Prefecture

• Imai Naomi

  Faculty of Liberal Arts and Sciences, University of Osaka Prefecture

• Inaba Tetsuo

  Faculty of Liberal Arts and Sciences, University of Osaka Prefecture

関連論文

• Photolysis of formaldehyde in the presence of nitric oxide.
• The Thermal Decomposition of Formaldehyde in the Presence of Nitric Oxide
• Thermal decomposition of dimethyl ether in the presence of nitrogen oxide.
• The Thermal Reaction of Hydrogen and Nitric Oxide
• The mercury-photosensitized reaction of hydrogen with nitric oxide.

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