AIP法によるTiN, ZrNおよびHfN薄膜の形成とその特性

概要

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Thin films of TiN, ZrN and HfN were deposited by the Arc Ion Plating process onto 18Cr-8Ni steel substrates at various values of PN2 and substrates bias voltage (Bv). Films were characterizated in terms of microhardness, critical load value (Lc) as measured by scratch tester, surface roughness (Ra), residual stress as measured by the sin2φ method, and X-ray diffraction. Hv 2620 for TiN, 3010 for ZrN, 3840 for HfN was obtained at PN2 of 10-1 to a few Pa and Bv of -50∼-100V. Residual stresses were predominant at a PN2 of greater than 6.7×10-2 Pa for TiN, and 6.7×10-2 to 1.3Pa for ZrN, but Bv had no effect on the (111) orientation. HfN films did not show the (111) orientation.
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