掩蔽作用に関する分析化学的研究(第3〜4報)

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Fundamental requirements for masking Cd2+, Zn2+, and Ni2+ by sulfosalicylic acid in an alkaline solution and the separation of metallic ions from the masking solution have been investigated. Sufficient masking of Cd2+ was obtained by using more than 2 moles against the Cd2+, provided that the masking solution had pH below 8. The Cd2+ was incompletely demasked by boiling. The Zn2+ sulfosalicylate complex was comparatively unstable in alkaline solution and the masking was possible only below pH 7, although it was possible at pH 8 by adding 30 times as much more of the agent as was added in the case of acidic pH. It was incompletely demasked by heating. The liberation of ions was made by the following methods, irrespective of the amount of sulfosalicylic acid used: Cd2+ by the oxine, carbonate, and sulfide methods, Zn2+ by the sulfide, oxine, phosphate, and ferrocyanide titration methods and Ni2+ by the dimethylglyoxime, oxine, and sulfide methods. Fundamental requirements for the separation of Co, 2+, Cr3+, and In3+ from their masking solution prepared by treating Co2+, Cr3+, and In3+ with an alkaline solution of sulfosalicylic acid have been investigated. The necessary amount of sulfosalicylic acid for masking Co2+, Cr3+, and In3+ was 5, 30, and 5 times, respectively. Masking of Cr3+ was possible only in the presence of NH4 salt; therefore, masking of Cr3+ by sulfosalicylic acid was difficult. Since Co2+ and In3+ were demasked by boiling, due care with respect to temperature was necessary in this case. Co2+ was demasked by star ding for a long time in a strongly alkaline solution (above pH 10). The asking solution of In3+ was stable up to pH 12. Separation of Co2+ from the masking solution was effected by the α-nitroso-β-naphthol, oxine and sulfide methods, and that of In3+ by the oxine and sulfide methods.
社団法人日本分析化学会の論文

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田中工
堺化学工業株式会

掩蔽作用に関する分析化学的研究(第3〜4報)

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