The Masking of Mn2+, Mg2+ and Cu2+ by Means of Sulfosalicylic Acid:Analytical Studies on Masking Reactions. II

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Fundamental requirements for masking Mn2+ Mg2+, and Cu2+ by sulfosalicylic acid in an alkaline solution have been investigated. An equimolar quantity of sulfosalicylic acid was found to be sufficient for masking Mn2+ but using 3 times this required amount gave a more stable compound, and this amount was also sufficient for Mg2+ and Cu2+ In the presence of NH4+ the amount of sulfosalicylic acid required was less. Better results were obtained by using pH below 11 for Mn2+ up to 10.5 (or above in the presence of NH4+) for Mg2+, and strongly alkaline medium for Cu2+. The masking solution for Mg2+ was stable below 80°C ; it did not decompose by boiling in ammoniacal solution. The separation of Mn2+was effected by the oxine method, that of Mg2+ by the oxine and phosphoric acid methods, and that of Cu2+ by the thiocyanate and sulfide methods.
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