真空冶金のための加速型プラズマ電子ビ-ム

概要

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A new acceleration method in hot hollow cathode discharge (HHCD) plasma beam is proposed.<BR>A neutral gas (He, Ar) in a central region along the discharge is pumped out locally and kept in an optimum pressure where electrons are collisionless and ions are collisional. Then, a voltage to accelerate electrons is applied for the central region while ion motions are restricted by the ion-neutral collisions to reduce a space charge of accelerated electrons. Electrons in a Ta hollow cathode discharge are accelerated up to 1.5 keV along a uniform magnetic field of 700 gauss. As a result, a plasma electron beam concentrated in a diameter of 8 mm is produced with a current which is controllable up to 80% of the discharge current (50 A max.) and independent of its accelerating voltage. It is remarkable also that the cathode is protected from bombardments with back stream ions and and that the starting of discharge is easy.<BR>Thus, we expect that a power efficiency entering into a sample anode will be much improved in comparison with an ordinary low voltage hollow cathode discharge.
日本真空協会の論文